Apparatus for coating or etching by means of a plasma

Details Apparatus for coating or etching by means of a plasma Apparatus for coating or etching by means of a plasma

1988-07-01

1989-09-05

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118620, 118728, 118 501, 156643, 156646, 156657, 156662, 20419237, 204298, 427 38, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

048635499

ABSTRACT:
The invention concerns apparatus for coating or etching by means of a plasma. Herein a first electrode (5) is connected to a high frequency voltage which produces plasma from a gas. A second electrode (6), on which the substrate (7) to be coated or etched is disposed, is connected to a medium frequency voltage which accelerates the ions of the plasma to the substrate (7). According to the invention, this medium frequency voltage consists of unipolar pulses that have the same amplitude for a predeterminable time interval. The number of ions impinging on the substrate (7) is thereby decoupled from the amplitude of the applied medium frequency voltage. It is determined solely by the frequency or width of these pulses.

REFERENCES:
patent: 4464223 (1984-08-01), Gorin
patent: 4500563 (1985-02-01), Ellenberger et al.
patent: 4585516 (1986-04-01), Corn et al.
patent: 4617079 (1986-10-01), Tracy et al.
"Multi-Electrode Plasma Etching," John Zajac et al., Tegal Process Review, May 1984, vol. 1, No. 1.
"Advances in Dry Etching Processes--A Review," S. J. Fonash, Solid State Technology, Jan. 1985.

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