Apparatus for coating materials by cathode sputtering

Details Apparatus for coating materials by cathode sputtering Apparatus for coating materials by cathode sputtering

1985-04-18

1986-11-11

Niebling, John F.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1434

Patent

active

046221212

ABSTRACT:
Arrangements for coating substrates, comprising a hollow cathode around the substrate with at least two sputtering zones with the proportion between the sputtering performances in the zone being adjustable, to obtain a more uniform coating also of lateral surfaces formed by steps on the substrate.

REFERENCES:
patent: 4385979 (1983-05-01), Pierce et al.
patent: 4414086 (1983-11-01), Lamont, Jr.
patent: 4434038 (1984-02-01), Morrison, Jr.
patent: 4444635 (1984-04-01), Kobayashi et al.
patent: 4465575 (1984-08-01), Love et al.
patent: 4498969 (1985-02-01), Ramachadran

Affiliated with

Also associated with

Rating

Apparatus for coating materials by cathode sputtering does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for coating materials by cathode sputtering, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for coating materials by cathode sputtering will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-375762