Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1987-09-09
1989-02-28
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118719, 118729, 414222, 414223, C23C 1456
Patent
active
048082910
ABSTRACT:
The present apparatus includes a rotating table which is loaded with removable carriers, each of which holds a substrate to be coated. The carriers are advanced to a loading position and are pushed from the table thereat into a hollow cylinder. Each carrier has a pair of O-rings on its periphery which are squeezed against the inside surface of the cylinder to effect a double seal. Each carrier pushes the carrier ahead of it up through the cylinder in a train like fashion. Along the cylinder there are vacuum stations which act to pump down and degas the substrates. Apertures are provided in the vacuum stations and these apertures are formed to permit the O-rings to expand as the carriers pass by the apertures without causing the O-rings to be cut or scored. Within a vacuum chamber there is included a vapor trap which helps remove water vapor from the substrates during the degassing operation.
REFERENCES:
patent: 4500407 (1985-02-01), Boys et al.
patent: 4701251 (1987-10-01), Beardow
patent: 4733631 (1988-03-01), Boyarsky
Boyarsky David
Denton Peter R.
Cleaver William E.
Denton Vacuum Inc.
Weisstuch Aaron
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