Apparatus for coating and/or etching substrates in a vacuum cham

Details Apparatus for coating and/or etching substrates in a vacuum cham Apparatus for coating and/or etching substrates in a vacuum cham

1993-12-01

1995-07-04

Chaudhuri, Olik

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

134 33, 216 37, C23F 102

Patent

active

054297052

ABSTRACT:
Apparatus for the coating and etching of substrates in a vacuum chamber (4), includes a cathode (17, 17') having a target (18, 18'), and a rotatable structure (8) shaped as an essentially cylindrical hollow body having circular disk-shaped end faces provided with pivot shafts (10, 10') held for rotation about a horizontal axis (r) in bearings (11, 11') disposed on the side walls (12, 12') of the vacuum chamber (4). Mountings (19, 19') for holding the substrates in place are provided on the circumference of the hollow body, the cathode (17, 17') and the etching anode (16) being disposed opposite the rotatable structure (8) in a plane (E) running horizontally and approximately in the plane of the axis of rotation (r).

REFERENCES:
patent: 4221652 (1980-09-01), Kuriyama
patent: 4388140 (1983-06-01), Nakazato et al.
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patent: 5211794 (1993-05-01), Enomoto et al.
patent: 5225057 (1993-07-01), Le Febvre et al.
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IBM Technical Disclosure Bulletin, Guggenheim, et al., vol. 20, No. 6, Nov. 1977.
N.N.: Elektronik Produktion & Pruftechnik, Sep. 1985, pp. 586-587, figure 16.

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