Apparatus for coating a substrate with dielectrics

Details Apparatus for coating a substrate with dielectrics Apparatus for coating a substrate with dielectrics

1988-09-28

1990-06-05

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 20429818, C23C 1434

Patent

active

049311697

ABSTRACT:
The invention relates to an apparatus for coating a substrate (1) with dielectrics which has a dc current source (10) connected to an electrode (5) which is connected to a target (3) which is being sputtered. The sputtered particles of the target (3) form a compound with an introduced substance which is deposited on the substrate (1). Permeating the target (3) are toroidal maganetic fields whose field lines emerge in the region of magnetic poles from the surface of the target (3). Under the invention an ac voltage source (30) is provided whose output voltage is superimposed on the dc voltage of the dc current source (10). Here, the electrical output of the ac current source (30) which is supplied to the electrode (5) corresponds to 5% to 25% of the output supplied by the dc current source (10) to the electrode (5).

REFERENCES:
patent: 3461054 (1969-08-01), Vratny
patent: 3617459 (1971-11-01), Logan
patent: 3679571 (1972-07-01), Ensslin
patent: 3767551 (1973-10-01), Lang, Jr. et al.
patent: 4572842 (1986-02-01), Dietrich et al.

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