Apparatus for coating a substrate by magnetron sputtering

Details Apparatus for coating a substrate by magnetron sputtering Apparatus for coating a substrate by magnetron sputtering

1993-11-08

1995-03-21

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429808, 20429811, C23C 1435

Patent

active

053992520

ABSTRACT:
A pair of magnetron cathodes in an evacuable coating chamber are connected to the outputs of the secondary winding of a transformer, the primary winding being connected to the outputs of a medium frequency A.C. generator. An oval target is mounted on each cathode and surrounded by stainless steel bars. As an alternative the bars may be configured as plates connected to ground and mounted to the target by insulating spacers.

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