Apparatus for coating a substrate

Details Apparatus for coating a substrate Apparatus for coating a substrate

1987-07-09

1990-05-29

Beck, Shrive

Coating apparatus

Gas or vapor deposition

Running length work

118314, 118326, 65 605, 65 6051, 65 6052, 65 602, 4272555, 427166, 427424, B05B 1512, B05B 1508

Patent

active

049286277

ABSTRACT:
A coating applicator is provided for depositing a film on a surface of glass and other substrates by chemical vapor deposition. The applicator includes a pair of opposing coating nozzles for applying a vaporized coating chemical reactant in a carrier gas to the surface at such a concentration and velocity that coating of the surface is achieved under substantially reaction rate controlled conditions. Each coating nozzle is positioned adjacent the surface with a small clearance therebetween which is open to the outside atmosphere. The opposing coating nozzles are directed toward each other at a selected angle with respect to a normal to the surface of the substrate. The angle and the clearance provides a condition where there is substantially no intermixing of coating vapors with the outside atmosphere.

REFERENCES:
patent: 3293074 (1966-12-01), Nickl
patent: 3876410 (1975-04-01), Scholes
patent: 4351267 (1982-09-01), Kalbskopf et al.
patent: 4574733 (1986-03-01), Nath et al.
patent: 4584206 (1986-04-01), Sleighter
patent: 4612217 (1986-09-01), Gordon

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