Apparatus for coating a photo-resist film and/or developing it a

Details Apparatus for coating a photo-resist film and/or developing it a Apparatus for coating a photo-resist film and/or developing it a

1990-12-14

1993-01-05

Mathews, A. A.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

354325, 134 66, 134 79, 134902, 414416, 414225, G03D 504, B65G 2500

Patent

active

051775140

ABSTRACT:
The resist-processing system according to the present invention includes at least one processing sections having a plurality of treatment units for performing various kinds of treatments on a semiconductor wafer such as the coating process and baking process, a loading section connected to the processing section for supplying the wafer to the processing section, a vacuum tweezer for carrying the wafer in the loading section so as to transfer the wafer from the loading section to the processing section, a handling robot for receiving the wafer from said loading section and transferring it in the processing section so as to load and unload the wafer to/from each of the treatment units, control means for controlling the operations of the vacuum tweezer and the handling robot in accordance with a predetermined program, and a passage provided in the processing section in such a manner the passage is disposed along with said plurality of treating units. Further, the handling robot travels through the passage in accordance with the predetermined program from the control means so as to stop by each of the treatment units in the order of the treatments required by the wafer.

REFERENCES:
patent: 4764076 (1988-08-01), Layman et al.
patent: 4917556 (1990-04-01), Stark
patent: 4985722 (1991-01-01), Ushijima et al.

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