Cleaning and liquid contact with solids – Apparatus – Having self cleaning means
Patent
1996-12-18
1998-09-01
Stinson, Frankie L.
Cleaning and liquid contact with solids
Apparatus
Having self cleaning means
1341044, 134902, 134155, 134186, 134109, 134201, B08B 304
Patent
active
057996784
ABSTRACT:
An improved apparatus for cleansing a semiconductor wafer which is capable of effectively removing the foreign substances from the wafer mounting grooves formed in the boats and the outer surface of the boat, for thus enhancing the reliability of the products. The apparatus includes an outer tub having a first cleansing liquid supply tube for supplying a cleansing liquid therethrough and a discharge tube for discharging the cleansing liquid therethrough, an inner tub disposed within the outer tub, a baffle plate disposed within the inner tub for distributing the cleansing liquid supplied to a wafer, a boat disposed on the baffle plate, on which boat a wafer is mounted, a foreign substance extraction tube disposed in a wafer support position of the boat for introducing the foreign substances formed in the interior of the inner tub thereinto and for discharging the same to the outside, and a second cleansing liquid supply tube for supplying the cleansing liquid to the foreign substance extraction tube.
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High Effective Rinse by Down Flow Bath System, Y. Hiratsuka et al., 24th Symposium On ULSI Ultra Clean Technology, Mar. 7-8, 1995, pp. 93-95.
LG Semicon Co. Ltd.
Stinson Frankie L.
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