Apparatus for cleaning the side-edge and top-edge of a semicondu

Details Apparatus for cleaning the side-edge and top-edge of a semicondu Apparatus for cleaning the side-edge and top-edge of a semicondu

1996-12-30

1998-03-10

Rose, Robert A.

Abrading

Abrading process

Glass or stone abrading

451 44, 451 63, 15 883, 15 77, B24B 100

Patent

active

057254141

ABSTRACT:
An apparatus for cleaning the side-edge and top-edge of a semiconductor wafer. The present invention provides an edge cleaning mechanism that cleans both the side-edge and top-edge of a wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.

REFERENCES:
patent: 4027686 (1977-06-01), Shortes et al.
patent: 4326553 (1982-04-01), Hall
patent: 5350428 (1994-09-01), Leroux et al.
patent: 5351360 (1994-10-01), Suzuki et al.

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