Apparatus for cleaning the edges of wafers

Details Apparatus for cleaning the edges of wafers Apparatus for cleaning the edges of wafers

2007-09-18

2007-09-18

Stinson, Frankie L. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

C134S157000, C134S198000, C134S902000

Reexamination Certificate

active

10450430

ABSTRACT:
The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning, thus resulting in increase of the yield rate of wafers. The apparatus includes a cleaning agent ejection nozzle body provided on a side part of a chuck for ejecting a particulate cleaning agent (CO2particles) towards the side and the edge portions of the wafer held and rotated by the chuck, and a nozzle body carriage for moving the nozzle body between rest and cleaning positions.

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