Apparatus for cleaning semiconductor wafers

Details Apparatus for cleaning semiconductor wafers Apparatus for cleaning semiconductor wafers

2007-08-14

2007-08-14

Barr, Michael (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

C134S095200, C134S095300, C134S184000, C134S186000, C134S200000, C134S902000

Reexamination Certificate

active

10410278

ABSTRACT:
An apparatus for cleaning semiconductor wafers includes a chamber, a bubbler having a vapor generating part for generating alcohol vapor and a spray pipe for spraying the alcohol vapor into the chamber, a gas supply nozzle for spraying gas into the chamber to dry the wafers, a liquid supply nozzle for supplying cleaning liquid into the chamber and a discharge system. The spray pipe of the bubbler has a liquid retention portion that keeps condensate of the alcohol vapor from issuing into the chamber. The gas supply nozzle has a spray outlet configured to spray the same amount of the drying gas onto all of the wafers in the chamber. The liquid supply nozzle has liquid supply openings only in a side portion thereof so that liquid alcohol will not become trapped therein.

REFERENCES:
patent: 5014727 (1991-05-01), Aigo
patent: 5569330 (1996-10-01), Schild et al.
patent: 5715612 (1998-02-01), Schwenkler
patent: 5807439 (1998-09-01), Akatsu et al.
patent: 5813133 (1998-09-01), Munter et al.
patent: 5932027 (1999-08-01), Mohindra et al.
patent: 6045621 (2000-04-01), Puri et al.
patent: 6354313 (2002-03-01), Florez
patent: 6401361 (2002-06-01), Chen et al.
patent: 6481447 (2002-11-01), Smith et al.
patent: 2002/0032973 (2002-03-01), Jung
patent: 2002/0132480 (2002-09-01), Shindo et al.
patent: 2002/0195125 (2002-12-01), Jung et al.
patent: 2000-0073750 (2000-12-01), None
patent: 2001-0112344 (2001-12-01), None

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