Cleaning and liquid contact with solids – Apparatus – With means to movably mount or movably support the work or...
Patent
1996-07-25
1997-05-06
Coe, Philip R.
Cleaning and liquid contact with solids
Apparatus
With means to movably mount or movably support the work or...
134161, 134902, B08B 312
Patent
active
056261594
ABSTRACT:
A method of cleaning a semiconductor wafer comprises placing liquid in a bath with a gas-liquid-interface defined at the surface of the liquid. A semiconductor wafer is placed in the bath so that it is oriented in a generally upright position with at least part of the wafer being in the liquid and below the gas-liquid-interface. Sonic energy is directed through the liquid. At least one of the position of the semiconductor wafer and the level of liquid in the bath relative to the semiconductor wafer is varied so that the entire surface of the wafer repeatedly passes through the gas-liquid-interface.
REFERENCES:
patent: 4804007 (1989-02-01), Bran
patent: 4854337 (1989-08-01), Bunkenburg et al.
patent: 4869278 (1989-09-01), Bran
patent: 4902350 (1990-02-01), Steck
patent: 5071776 (1991-12-01), Matsushita et al.
patent: 5090432 (1992-02-01), Bran
patent: 5143103 (1992-09-01), Basso et al.
patent: 5203798 (1993-04-01), Watanabe et al.
patent: 5279316 (1994-01-01), Miranda
patent: 5286657 (1994-02-01), Bran
patent: 5327921 (1994-07-01), Mokuo et al.
patent: 5468302 (1995-11-01), Thietje
Cyrus Glickstein, Acoustica Associates, Inc., "Basic Ultrasonics", Apr. 1960, p. 93.
Bartram Ronald D.
Chai Jing
Erk Henry F.
Hollander Eugene R.
Coe Philip R.
MEMC Electronic Materials , Inc.
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