Apparatus for cleaning semiconductor wafers

Details Apparatus for cleaning semiconductor wafers Apparatus for cleaning semiconductor wafers

1995-09-26

1997-04-29

Warden, Jill

Cleaning and liquid contact with solids

Processes

Using solid work treating agents

134 32, 134 33, 134902, 15 882, 15 971, B08B 700

Patent

active

056245017

ABSTRACT:
Opposed, conically shaped brushes are utilized to mechanically and chemically removed foreign material from the surfaces of a semiconductor wafer. The brushes are be readily accessed for cleaning and contact a relatively large surface area of the wafer.

REFERENCES:
patent: 3970471 (1976-07-01), Bankes et al.
patent: 4344260 (1982-08-01), Ogiwara
patent: 4662124 (1987-05-01), Kato et al.
patent: 4811443 (1989-03-01), Nishizawa
patent: 5311634 (1994-05-01), Andros
patent: 5351360 (1994-10-01), Suzuki et al.
patent: 5375291 (1994-12-01), Tateyama et al.

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