Apparatus for cleaning and rinsing wafers

Details Apparatus for cleaning and rinsing wafers Apparatus for cleaning and rinsing wafers

1990-08-02

1991-12-03

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With alarm, signal, indicating, testing, inspecting,...

134182, 134186, 134902, B08B 304

Patent

active

050692356

ABSTRACT:
Apparatus for cleaning and rinsing wafers is disclosed. The apparatus includes an inner tank contained within an outer tank. The inner tank has an open top forming a weir edge around the entire top of the tank. A bottom opening in the inner tank is covered by a dump door. The inner tank is contoured so that its cross-sectional area decreases in a direction toward the bottom of the tank. Sprayer manifolds are positioned slightly above the top edge of the inner tank to spray water into the inner tank. Wafers are positioned in the inner tank on a support plate. Manifolds below the support plate allow filling of the tank with water and nitrogen gas. The dump door is opened or closed by a pneumatic piston depending on whether the inner tank is being dumped or filled. A controller operates the apparatus to cycle through a predetermined program including dump, partial dump, cascade and spraying cycles. A monitoring system withdraws water from the outer tank and monitors the water for particular characteristics including resistivity, conductivity and redox potential.

REFERENCES:
patent: 4092176 (1978-05-01), Kozai et al.
patent: 4325394 (1982-04-01), Reams
patent: 4361163 (1982-11-01), Aigo
patent: 4601300 (1986-07-01), Sundheimer
patent: 4753258 (1988-06-01), Seiichiro
patent: 4934392 (1990-06-01), Henfrey
patent: 4955402 (1990-09-01), Miranda

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