Apparatus for cleaning a substrate with metastable helium

Details Apparatus for cleaning a substrate with metastable helium Apparatus for cleaning a substrate with metastable helium

1992-06-04

1994-06-07

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723MR, H01L 2100

Patent

active

053186540

ABSTRACT:
An apparatus for cleaning a surface includes first and second reaction containers, a holding apparatus for holding, in the second reaction container, a substance to be processed on the surface of which foreign matter is present, an apparatus for supplying helium gas into the first reaction container, an apparatus for generating helium ions, electrons, and metastable helium by exciting helium gas in the first reaction container, and an apparatus for separating the metastable helium generated in the first reaction container and for introducing the metastable helium into the second reaction container.

REFERENCES:
patent: 3673071 (1972-06-01), Pritchard et al.
patent: 3983264 (1976-09-01), Schroen et al.
patent: 4244799 (1981-01-01), Fraser et al.
patent: 4711698 (1987-12-01), Douglas
patent: 4795717 (1989-01-01), Okamura
patent: 4831963 (1989-05-01), Saito et al.
patent: 4863561 (1989-09-01), Freeman et al.
patent: 5002632 (1991-03-01), Loewenstein et al.
patent: 5021114 (1991-06-01), Saito et al.
patent: 5162633 (1992-11-01), Sarobe et al.
Ikawa et al., "Si Surface Treatment Using Deep UV Irradiation",1985 Dry Process Symposium, NEC Corporation, pp. 25-29.
Irino et al., "The Removal Method Of Carbon Contamination By R.I.E.", Applied Physics Society, 1987, p. 562

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