Cleaning and liquid contact with solids – Processes – Work handled in bulk or groups
Patent
1991-10-29
1992-10-27
Stinson, Frankie L.
Cleaning and liquid contact with solids
Processes
Work handled in bulk or groups
134 32, 134902, B08B 304
Patent
active
051586169
ABSTRACT:
A cleaning apparatus is disclosed which is used in a manufacturing process of a semiconductor device. A plurality of treatment chambers are vertically mounted in a parallel array along a path of carriage of a substrate to be treated. One sheet of substrate is held within one of the treatment chambers at a time. The width of the treatment chamber is so small as to properly contain the substrate in a direction of the thickness of the substrate and hence the whole length of the cleaning apparatus can be made smaller. The substrate is held by a universally-jointed arm which is mounted on a carrier, and inserted/withdrawn into/out of the treatment chamber by that arm. The treatment chamber is of the type wherein a substrate is immersed into a cleaning solution, a support base is mounted therein to maintain the substrate vertically, and an ultrasound oscillation source is provided therein.
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Fushiki Kazuo
Kinoshita Akira
Stinson Frankie L.
Tokyo Electron Limited
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