Apparatus for chemically treating a single side of a workpiece

Details Apparatus for chemically treating a single side of a workpiece Apparatus for chemically treating a single side of a workpiece

1977-05-19

1978-10-03

Lefevour, Charles F.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204237, C25D 1700

Patent

active

041183037

ABSTRACT:
An apparatus for chemically treating a single side of a workpiece, such as for etching or anodizing a semiconductor wafer, comprising, a flat centrally apertured, relatively level table having a top or work surface on which a workpiece is placed face down and of a size and shape commensurate with the dimensions of the workpiece, and means for introducing the liquid for the chemical treatment between the top surface and side of the workpiece to be treated where the liquid passes over the entire surface to be treated and then returns to its source. The apparatus also includes, for certain applications, means for a pre-processing of the workpiece by oxidizing the workpiece surface on the side of the workpiece opposite of the one to be treated to prevent creeping of the liquid around the edges thereof.

REFERENCES:
patent: 2745805 (1956-05-01), Jones, Jr.
patent: 3317410 (1967-05-01), Croll et al.
patent: 3536594 (1970-10-01), Pritchard
patent: 3907649 (1975-09-01), Becker

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