Apparatus for chemical vapor deposition of diamond including the

Details Apparatus for chemical vapor deposition of diamond including the Apparatus for chemical vapor deposition of diamond including the

1993-12-27

1995-03-14

Chaudhuri, Olik

Coating apparatus

Semiconductor vapor doping

118725, C23C 1600

Patent

active

053973968

ABSTRACT:
Temperature uniformity and control in apparatus for chemical vapor deposition of diamond is improved by contacting the rear of the substrate assembly, which may be a substrate or a holder containing substrates, with a thermal spreader, preferably of copper and preferably having heating means embedded therein or associated therewith. The thermal spreader contacts a thermal resistance unit, preferably of stainless steel, which in turn is in contact with a cooling element that preferably has coolant passages therein.

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patent: 5160544 (1992-11-01), Garg et al.
patent: 5314570 (1994-05-01), Ikegaya et al.
patent: 5340401 (1994-08-01), Cann

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