Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1985-02-14
1987-01-13
Bueker, Richard
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 531, 427 74, 427 85, 4272552, 118692, 118683, 118715, 118719, 118723, 118 501, C23C 1308
Patent
active
046364013
ABSTRACT:
An apparatus for conducting chemical vapor deposition reduced pressure, comprising: means for feeding reactive gases; a reaction vessel for depositing a film layer from the reactive gases by application of thermal energy, light energy or electric energy singly or in combination; an exhaust means for exhausting unnecessary reactive gases and unnecessary reaction products from the reaction vessel and for vacuumizing or reducing pressure of the reaction vessel, including a turbo molecular pump and a pressure control valve interposed between the reaction vessel and a roughing rotary pump; and a method of chemical vapor deposition using such apparatus.
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patent: 4461783 (1984-07-01), Yamazaki
patent: 4485125 (1984-11-01), Izu et al.
Dylla, "Turbomolecular Pump Vacuum System for the Princeton Large Torus", J. Vac. Sci. & Tech., vol. 15, No. 2, pp. 734-740, 1978.
Outlaw, "Ultrahigh Vacuum Produced by a Combination of Turbomolecular and Titanium Sublimation Pumping", J. Vac. Sci. & Tech., vol. 3, No. 6, pp. 352-354, 1966.
Weil et al, "Glow-Discharge a-SiiF Prepared from SiF.sub.2 Gas", Journal de Physique, Oct. 1981, pp. 643-646.
Maissel et al, Handbook of Thin Film Technology, McGraw-Hill Book Company, pp. 2-4 to 2-9.
Miyazaki Minoru
Tashiro Mamoru
Yamazaki Shunpei
Bueker Richard
Ferguson Jr. Gerald J.
Hoffman Michael P.
Malamud Ronni S.
Semiconductor Energy Laboratory Co,. Ltd.
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