Apparatus for chemical vapor deposition

Details Apparatus for chemical vapor deposition Apparatus for chemical vapor deposition

1976-11-19

1977-12-13

Kaplan, Morris

Coating apparatus

With cutting, punching or tearing of work

Web or sheet work

118500, C23C 1308

Patent

active

040623181

ABSTRACT:
An apparatus for chemically vapor-depositing a material onto surfaces of a plurality of substrates within a reaction chamber comprises means positioned within the chamber for supporting the substrates in a stack-like relationship wherein the surfaces are substantially parallel to each other and are separated by spacings, and a plurality of gas nozzles connected to a source of gas and positioned within the chamber so that the flow of gas therefrom is directed, respectively, into the spacings between the surfaces. A method of utilizing this apparatus comprises rotating the substrates while moving the nozzles back and forth in an arc, so that the flow of gas therefrom is directed into the spacings at different angles.

REFERENCES:
patent: 4018183 (1977-04-01), Meuleman

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