Coating apparatus – Gas or vapor deposition – Means to coat or impregnate particulate matter
Patent
1986-05-16
1987-10-13
Pianalto, Bernard D.
Coating apparatus
Gas or vapor deposition
Means to coat or impregnate particulate matter
118 501, 118717, 118719, 118725, 118726, 118728, C23C 1600
Patent
active
046990828
ABSTRACT:
An apparatus for the chemical vapor deposition on substrates of coatings comprising compounds of a titanium sub-group of metals, the vanadium sub-group of metals and the chromium sub-group of metals at temperatures in the range of 250.degree. to 850.degree. C. is disclosed. Sub-halides, such as TiCl.sub.3, are reacted with N.sub.2 and H.sub.2 and thermodynamic and kinetic parameters are manipulated by flow rates and partial pressures of the reactants to achieve the deposition reaction in the temperature range of 250.degree. to 850.degree. C.
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Liburdi Engineering Limited
Pianalto Bernard D.
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