Apparatus for carrying substrates processed in an etching proces

Details Apparatus for carrying substrates processed in an etching proces Apparatus for carrying substrates processed in an etching proces

1999-07-29

2000-09-12

Lund, Jeffrie R

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

134 82, 414935, C23F 102, B08B 300, B65G 4907

Patent

active

061172685

ABSTRACT:
The apparatus of the present invention is used to carry substrates processed in an etching process and provides a guiding member to shelter and protect substrates from being dampened by droplets. The apparatus comprises spaced chucks connected to a substrate holder with two arms, respectively. The guiding member is a roof plate disposed under the chucks and abutted against the arms, so that the guiding member can induce the droplets falling from the chucks to flow to the arms. The substrates can be effectively kept dry and clean.

REFERENCES:
patent: 3964957 (1976-06-01), Walsh
patent: 5685040 (1997-11-01), Onodera
patent: 5829156 (1998-11-01), Shibasaki et al.

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