Apparatus for automatic semi-batch sheet treatment of semiconduc

Details Apparatus for automatic semi-batch sheet treatment of semiconduc Apparatus for automatic semi-batch sheet treatment of semiconduc

1980-09-16

1982-06-22

Goldberg, Elliot A.

Electric heating

Metal heating

By arc

219121PD, 219121EN, 219121PX, 198339, 53228, 271275, 156646, 156643, 414222, B23K 900, B65H 106

Patent

active

043364381

ABSTRACT:
An apparatus for automatic semi-batch sheet treatment of wafers such as high-purity silicon semiconductor wafers by plasma reaction is disclosed. The apparatus comprises a wafer carrying mechanism, a reaction chamber with an opening at the bottom, a wafer table disposed beneath the opening and provided with a sub-table for mounting the wafer, and control devices for driving the above elements in linkage motion. The wafer carrying mechanism is substantially composed of a conveyor for carrying a wafer to be treated, a pair of open-close type wafer carrying wire conveyors which are spaced in parallel at a certain distance and open and close in linkage motion so that the wafer table may pass vertically therethrough to be fixed vacuum-tightly to the reaction chamber, a mechanism for opening and closing the wire conveyors and a treated wafer carrying conveyor. The subtable is vertically movable and capable of passing the wire conveyors when closed.

REFERENCES:
patent: 3213997 (1965-10-01), Fryer
patent: 3623719 (1971-11-01), Dokoupil et al.
patent: 3812947 (1974-05-01), Nygaard
patent: 4149923 (1979-04-01), Uehara et al.
patent: 4151034 (1979-04-01), Yamamoto et al.
patent: 4208159 (1980-06-01), Uehara et al.
patent: 4263088 (1981-04-01), Gorin

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