Apparatus for automatic baking treatment of semiconductor wafers

Details Apparatus for automatic baking treatment of semiconductor wafers Apparatus for automatic baking treatment of semiconductor wafers

1988-01-27

1988-10-18

Yuen, Henry C.

Heating

Work feeding, agitating, discharging or conveying...

432 6, 432253, 432152, 414156, F27D 500

Patent

active

047783826

ABSTRACT:
An apparatus for baking treatment of semiconductor wafers comprises a furnace portion and a conveyor portion. The furnace portion has a baking chamber in which is installed a turntable on which baking cassettes are supported during baking treatment and a mechanism for circulating hot air through the baking chamber. The conveyor portion has a conveyor mechanism which moves cassettes for transporting wafers along a path from an entrance to an exit of the conveyor portion, a transferring mechanism which can transfer wafers from a cassette for transporting wafers to a baking cassette and vice versa, and a cassette insertion and removal mechanism for inserting and removing a baking cassette from the baking chamber of the furnace portion and mounting it on and removing it from the turntable. The operation of the apparatus is controlled by a CPU in such a manner that immediately after the baking treatment is completed in the furnace portion, the baking cassette is removed from the furnace portion and the wafers contained therein are transferred to a transporting cassette which is maintained at ambient temperature to shorten the time required to cool the wafers.

REFERENCES:
patent: 3934733 (1976-01-01), Worden
patent: 4439146 (1984-03-01), Sugita
patent: 4484538 (1984-11-01), Sarkozy et al.
patent: 4516897 (1985-05-01), Snider et al.
patent: 4518349 (1985-05-01), Tressler et al.
patent: 4523885 (1985-06-01), Bayne et al.
patent: 4610628 (1986-09-01), Mizushina

Affiliated with

Also associated with

Rating

Apparatus for automatic baking treatment of semiconductor wafers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for automatic baking treatment of semiconductor wafers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for automatic baking treatment of semiconductor wafers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1192120