Apparatus for applying thin layers to a substrate

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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Details

20429809, 20429811, 20429814, 20429806, C23C 1434

Patent

active

056627840

ABSTRACT:
Hollow members having conduits for process gas and coolant are mounted in parallel on sidewall of a vacuum chamber with a sputtering cathode therebetween. Anode members having an L-shaped cross section are mounted over the hollow members and held in place by thumb screws in threaded bores of strips fixed to the chamber walls above the hollow members. Mask members having a Z-shaped cross section are mounted over the anodes and are also held in place by the thumb screws.

REFERENCES:
patent: 4425218 (1984-01-01), Robinson
patent: 4849087 (1989-07-01), Meyer
patent: 4946576 (1990-08-01), Dietrich et al.
patent: 5223111 (1993-06-01), Lueft

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