Apparatus for applying photo resist on both surfaces of semicond

Details Apparatus for applying photo resist on both surfaces of semicond Apparatus for applying photo resist on both surfaces of semicond

1980-12-17

1982-08-17

Kendall, Ralph S.

Coating apparatus

With heat exchange, drying, or non-coating gas or vapor...

Plural treatments

118314, 118324, 118503, 427209, 430313, B05C 1302

Patent

active

043443800

ABSTRACT:
An apparatus for applying photo resist on both surfaces of a semiconductor wafer is disclosed. The apparatus comprises a first conveying section for successively conveying semiconductor wafers one by one, a first photo resist application section provided on the way of the conveying section, a first drying section provided on the way of said first conveying section in the order after the first photo resist application section, a second conveying section connected to said first conveying section for successively conveying semiconductor wafers one by one, a reversing section provided on the way of the second conveying section for reversing the semiconductor wafer, a third conveying section connected to said second conveying section for successively conveying semiconductor wafers one by one, a second photo resist application section provided on the way of the third conveying section, and a second drying section provided on the way of said third conveying section in the order after the second photo resist application section.

REFERENCES:
patent: 2723921 (1955-11-01), Starkey
patent: 3173804 (1965-03-01), Standfuss
patent: 3610397 (1971-10-01), Bok
patent: 3986476 (1976-10-01), Yano
patent: 4060052 (1977-11-01), Algeri et al.

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