Apparatus for applying photo resist on both surfaces of semicond

Coating apparatus – With heat exchange – drying – or non-coating gas or vapor... – Plural treatments

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Details

118314, 118324, 118503, 427209, 430313, B05C 1302

Patent

active

043443800

ABSTRACT:
An apparatus for applying photo resist on both surfaces of a semiconductor wafer is disclosed. The apparatus comprises a first conveying section for successively conveying semiconductor wafers one by one, a first photo resist application section provided on the way of the conveying section, a first drying section provided on the way of said first conveying section in the order after the first photo resist application section, a second conveying section connected to said first conveying section for successively conveying semiconductor wafers one by one, a reversing section provided on the way of the second conveying section for reversing the semiconductor wafer, a third conveying section connected to said second conveying section for successively conveying semiconductor wafers one by one, a second photo resist application section provided on the way of the third conveying section, and a second drying section provided on the way of said third conveying section in the order after the second photo resist application section.

REFERENCES:
patent: 2723921 (1955-11-01), Starkey
patent: 3173804 (1965-03-01), Standfuss
patent: 3610397 (1971-10-01), Bok
patent: 3986476 (1976-10-01), Yano
patent: 4060052 (1977-11-01), Algeri et al.

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