Coating apparatus – Immersion or work-confined pool type – Capillary passages or barometric column feed
Patent
1994-03-21
1996-03-12
Warden, Robert J.
Coating apparatus
Immersion or work-confined pool type
Capillary passages or barometric column feed
118 64, 118429, 3461401, B05C 502
Patent
active
054982898
ABSTRACT:
An apparatus for producing a linear pattern having a width less than 100 microns and a resistivity of the order of 10.sup.-6 .OMEGA..multidot.cm on a substrate includes a tank for maintaining a low melting point metal in a fused state and having a narrow passage for flow of the fused metal, a drawing head having a fine groove connected to the narrow passage of the tank, and a tip close to or in contact with a substrate, the fused metal flowing to the tip of the drawing head through the groove by capillary action for application to the surface of the substrate.
REFERENCES:
patent: 3536039 (1970-10-01), Gardiner
patent: 4017871 (1977-04-01), Hubbard
patent: 4320250 (1982-03-01), Corwin et al.
patent: 4485387 (1984-11-01), Drumheller
patent: 4511600 (1985-04-01), Leas
patent: 4694115 (1987-09-01), Lillington et al.
patent: 4952089 (1990-08-01), Schneider
patent: 5044305 (1991-09-01), Shibata et al.
patent: 5045358 (1991-09-01), Watanabe et al.
patent: 5052626 (1991-10-01), Wood et al.
patent: 5143759 (1992-01-01), Saito et al.
patent: 5151377 (1992-09-01), Hanoka et al.
Mathias, "Additive Direct Writing: An Emerging Technology", Micropen, Inc., Pittsford, N.Y., Apr. 1989.
Micropen Brochure, Micropen, Inc. Pittsford, N.Y.
Micropen Direct Writing and Precision Dispensing System, Brochure, Micropen, Inc., Pittsford, NY.
Lawrence, "Thick Film Conductive Ink Contacts For Concentrator Cells", Conference Record, 14th IEEE Photovoltaic Specialists Conference, 1980, pp. 541-544.
Blakers et al, "Fabrication Of Thick Narrow Electrodes On Concentrator Solar Cells", Journal of Vacuum Science, vol. 20, No. 1, 1982, pp. 13-15.
Mitsubishi Denki & Kabushiki Kaisha
Tran Hien
Warden Robert J.
LandOfFree
Apparatus for applying narrow metal electrode does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for applying narrow metal electrode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for applying narrow metal electrode will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2097891