Apparatus for applying multilayer optical interference coating o

Details Apparatus for applying multilayer optical interference coating o Apparatus for applying multilayer optical interference coating o

1987-10-05

1989-05-09

Pianalto, Bernard

Coating apparatus

Control means responsive to a randomly occurring sensed...

Condition of coated material

118 501, 118620, 118728, 427 38, 427164, 427296, 4272556, B05C 1100

Patent

active

048278700

ABSTRACT:
Precision multilayer optical interference coating of substrates having complex topology using complementary shaped electrodes and plasma enhanced chemical vapor deposition within a chamber. The materials for the optical quality thin films are obtained from starting reactants of the form M-R where M denotes a metal atom and R denotes an organic component. These starting reactants are brought into a reactive atmosphere of the chamber through a plurality of orifices in one of the shaped electrodes. The resulting substances are deposited as thin films upon the substrates.

REFERENCES:
patent: 3871739 (1975-03-01), Poulsen
patent: 3953652 (1976-04-01), Addiss, Jr. et al.
patent: 4096315 (1978-06-01), Kubacki
patent: 4152478 (1979-05-01), Takagi
patent: 4237183 (1980-12-01), Fujiwara et al.
patent: 4579639 (1986-04-01), Enomoto et al.
patent: 4652467 (1987-03-01), Brinker et al.

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