Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1996-11-13
1998-05-26
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429804, 20429805, 20429823, 20429829, C23C 1434
Patent
active
057559376
ABSTRACT:
An apparatus and method for supporting and agitating a plurality of loose objects during a procedure known as sputter coating. A magnetron gun and the apparatus are positioned within a vacuum chamber. The magnetron or sputtering gun produces a metal ion fog or vapor within the chamber which freely penetrates through screen mesh surfaces of a suspended basket of the apparatus containing the objects to be sputter coated. A solenoid or other suitable device vibrates the basket, agitating, and repeatedly momentarily suspending and reorienting the objects to achieve a very uniform metal layer being applied atop the objects. By changing the magnetron target or by using multiple magnetron, thin layers of multiple metals or layers with metal mixtures are also achievable with this technique.
REFERENCES:
patent: 3892651 (1975-07-01), Salisbury et al.
patent: 4080281 (1978-03-01), Endo
patent: 4560462 (1985-12-01), Radford et al.
patent: 5470388 (1995-11-01), Goedicke et al.
Miley George H.
Patterson James A.
Williams Michael J.
Nguyen Nam
Prescott Charles J.
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