Apparatus for applying film coatings onto substrates in vacuum

Details Apparatus for applying film coatings onto substrates in vacuum Apparatus for applying film coatings onto substrates in vacuum

1989-03-14

1990-10-09

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429825, C23C 1434

Patent

active

049618326

ABSTRACT:
The apparatus for applying film coatings onto substrates in vacuum comprises a vacuum working chamber with a holder of substrates and magnetron material sputtering units, an evacuation chamber equipped with magnetron pump and communicating with a gas source, a pre-evacuation pump, an auxiliary evacuation chamber with a magnetron pump, an auxiliary gas source and a system of conduits. The system includes a conduit equipped with a control valve, communicating the auxiliary gas source with the auxiliary evacuation chamber, and two conduits each with its control valve, communicating the respective gas sources with the working chamber.

REFERENCES:
patent: 3484358 (1969-12-01), Androshuk et al.
patent: 3691053 (1972-09-01), James et al.
patent: 4606929 (1986-08-01), Petrakov
"Technology of Magnetron Spraying for Producing Thin Films for Electronic Industry", Leybold-Heraeus Co., Germany.

Affiliated with

Also associated with

Rating

Apparatus for applying film coatings onto substrates in vacuum does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for applying film coatings onto substrates in vacuum, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for applying film coatings onto substrates in vacuum will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-971681