Apparatus for applying disparate etching solutions to...

Details Apparatus for applying disparate etching solutions to... Apparatus for applying disparate etching solutions to...

2006-07-11

2006-07-11

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

For work having hollows or passages

C134S094100, C134S201000

Reexamination Certificate

active

07073522

ABSTRACT:
Described are methods, systems, and chemistries for cleaning various components of semiconductor process equipment. A method in accordance with one embodiment cleans articles with differently contaminated interior and exterior surfaces by using those articles to separate a cleaning vessel into separate chambers, one chamber for the interior surface and one for the exterior surface. Different chemistries are then applied to the differently contaminated surfaces. This embodiment reduces the required volume of etchant, and consequently saves the cost, treatment, and disposal of toxic chemicals. One embodiment further reduces the requisite etchant volume using one or more volume-displacement elements that displace some of the etchant volume.

REFERENCES:
patent: 5979475 (1999-11-01), Satoh et al.
patent: 6248177 (2001-06-01), Halbmaier
patent: 6607605 (2003-08-01), Tan
patent: 6926017 (2005-08-01), Halbmaier

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