Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1988-12-06
1990-06-12
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419211, 20429807, 20429809, 20429816, 20429824, C23C 1446
Patent
active
049330659
ABSTRACT:
In an apparatus for applying materials to a substrate (15) disposed in a vacuum chamber (17), having an electron emitter (9) and having magnet coils (30, 39) disposed outside of the vacuum chamber (16, 17), the electron emitter (9) is disposed in a separate generator chamber (37) communicating with the vacuum chamber (17) and forming the anode (11) and, after the introduction of the process gas into the generator chamber (37), produces a large-area plasma jet (S) which, under the action of magnets (12, 21), passes through an opening (25) in the wall (28) of the vacuum tank (1) forming the vacuum chamber (16, 17). The positive ions are accelerated, by application of a variable negative voltage, from the plasma jet (S) onto the target (7) of drum-shaped configuration mounted in the vacuum chamber (17) for rotation on a pedestal (24), from which target the sputtered metal atoms are deflected onto the substrate (15).
REFERENCES:
patent: 3408283 (1968-10-01), Chopra et al.
patent: 4108751 (1978-08-01), King
patent: 4424103 (1984-01-01), Cole
patent: 4885070 (1989-12-01), Campbell et al.
Leybold Aktiengesellschaft
Weisstuch Aaron
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