Coating apparatus – With vacuum or fluid pressure chamber
Patent
1999-08-09
2000-10-10
Edwards, Laura
Coating apparatus
With vacuum or fluid pressure chamber
118301, 118304, 118309, 118326, 118DIG7, B05C 502
Patent
active
061290394
ABSTRACT:
An apparatus and method for evenly applying an atomized adhesive for bonding a die to a leadframe is disclosed. In one embodiment the apparatus includes a hood in communication with an air supply and a vacuum plenum that encompass a semiconductor device component located in a target area during adhesive application so that the adhesive is selectively applied to specific portions of the leadframe or other semiconductor device component and adhesive is not allowed outside the system. A mask or stencil may be employed for further prevention of adhesive application to undesired areas. An air purge may be employed to direct the adhesive mist toward the component to be coated. In another embodiment, a fine adhesive spray is directed against the surface of the workpiece to be coated, selected areas being masked to prevent coating. Wafers may be coated as well as leadframes.
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Edwards Laura
Micro)n Technology, Inc.
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