Apparatus for applying a mask to and/or removing it from a subst

Details Apparatus for applying a mask to and/or removing it from a subst Apparatus for applying a mask to and/or removing it from a subst

1993-12-07

1996-04-02

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Multizone chamber

118721, 118505, 20429811, 20429825, 414217, C23C 1400

Patent

active

055036759

ABSTRACT:
First and second transport chambers are joined to one another through a common opening (5), and house respective substrate carriers (6, 7) mounted for rotation about parallel axes. In at least one position the carriers may be superposed, plungers (14 and 15) being disposed in the area of this superposition on opposite sides of the carriers, both carriers being longitudinally displaceable parallel to the pivot axes (a and b, respectively). After a coating operation in the second transport chamber, the second plunger releases the mask from the second carrier, moves it back to the first carrier where the substrate is peripherally engaged, then moves the mask still further in order to release it from the substrate. The second plunger then retreats, and the coated substrate can be rotated in the first chamber.

REFERENCES:
patent: 3838028 (1974-09-01), Needham et al.
patent: 3915117 (1975-10-01), Schertler
patent: 4548699 (1985-10-01), Hutchinson et al.
patent: 4735540 (1988-04-01), Allen et al.
patent: 4745878 (1988-05-01), Sagawa
patent: 4886592 (1989-12-01), Anderle
patent: 4938858 (1990-07-01), Zejda
patent: 4943363 (1990-07-01), Zejda et al.
patent: 5112469 (1992-05-01), Kempf et al.
patent: 5354380 (1994-10-01), Zejda

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