Coating apparatus – With means to centrifuge work – Reciprocating centrifuge
Patent
1974-07-08
1976-08-17
McIntosh, John P.
Coating apparatus
With means to centrifuge work
Reciprocating centrifuge
118320, 118416, 118500, 134140, 134 25A, B05C 1302, B05C 500, B05C 302
Patent
active
039747972
ABSTRACT:
In a method and apparatus for applying light sensitive materials to semiconductor slices, a plurality of semiconductor slices are supported in a spaced apart array extending along an axis. The slices are supported on knife edges positioned at circumferentially spaced points about the axis and each extending angularly both with respect to the axis and with respect to the radii of the slices so that the slices are supported by means of point contact with their edge portions. In one embodiment the knife edge comprise combs mounted in a cylindrical support fixture formed from an open material and including hingedly interconnected half cylinders. In another embodiment the knife edges are supported in a cup-shaped support fixture formed from an open material and adapted to receive semiconductor slices of varying sizes and particularly broken semiconductor slices.
Light sensitive material is simultaneously applied to all of the semiconductor slices in the support fixture. This may be accomplished either by dipping the support fixture and the semiconductor slices contained therein into a quantity of light sensitive material, or by spraying light sensitive material through the support fixture and onto the semiconductor slices. The support fixture is then rotated about the axis at a predetermined rate for a predetermined time in order to uniformly distribute a predetermined thickness of the light sensitive material over the entire surface areas of the semiconductor slices.
REFERENCES:
patent: 713621 (1902-11-01), Ellis et al.
patent: 2082004 (1937-06-01), Hull
patent: 2218165 (1940-10-01), Gaebel
patent: 2614316 (1952-10-01), Daily et al.
patent: 3734337 (1973-05-01), Garrison
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