Optics: measuring and testing – Of light reflection
Reexamination Certificate
2007-02-09
2010-02-09
Toatley, Jr., Gregory J (Department: 2877)
Optics: measuring and testing
Of light reflection
C356S628000
Reexamination Certificate
active
07659988
ABSTRACT:
To inspect all portions of the substrate the substrate table can be moved rotationally and linearly. Furthermore the detector can be moved rotationally. This enables all portions of a surface of the substrate to be inspected from all angles in a plane parallel to the substrate. Less linear motion is needed, so the apparatus occupies a smaller volume and generates smaller vibrations.
REFERENCES:
patent: 5703692 (1997-12-01), McNeil et al.
patent: 5880838 (1999-03-01), Marx et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6608690 (2003-08-01), Niu et al.
patent: 6699624 (2004-03-01), Niu et al.
patent: 6704661 (2004-03-01), Opsal et al.
patent: 6721691 (2004-04-01), Bao et al.
patent: 6738138 (2004-05-01), Wei
patent: 6753961 (2004-06-01), Norton et al.
patent: 6768983 (2004-07-01), Jakatdar et al.
patent: 6772084 (2004-08-01), Bischoff et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6813034 (2004-11-01), Rosencwaig et al.
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6856408 (2005-02-01), Raymond
patent: 6919964 (2005-07-01), Chu
patent: 6928628 (2005-08-01), Seligson et al.
patent: 6972852 (2005-12-01), Opsal et al.
patent: 6974962 (2005-12-01), Brill et al.
patent: 6987572 (2006-01-01), Lakkapragada et al.
patent: 7046376 (2006-05-01), Sezginer
patent: 7053991 (2006-05-01), Sandusky
patent: 7061615 (2006-06-01), Lowe-Webb
patent: 7061623 (2006-06-01), Davidson
patent: 7061627 (2006-06-01), Opsal et al.
patent: 7068363 (2006-06-01), Bevis et al.
patent: 7215431 (2007-05-01), Opsal
patent: 2004/0119970 (2004-06-01), Dusa et al.
patent: 2004/0257571 (2004-12-01), Mieher et al.
patent: 2006/0033921 (2006-02-01), Den Boef et al.
patent: 2006/0066855 (2006-03-01), Den Boef et al.
patent: 2006/0076509 (2006-04-01), Okino et al.
patent: 2006/0126074 (2006-06-01), Van Der Werf et al.
patent: 2006/0139592 (2006-06-01), Den Boef et al.
patent: 2007/0279644 (2007-12-01), Teun Plug et al.
patent: 2008/0266560 (2008-10-01), Kok
Kok et al., “Apparatus for Angular-Resolved Spectroscopic Lithography Characterization and Device Manufacturing Method”, U.S. Appl. No. 11/478,306, filed Jun. 30, 2006.
Non-Final Rejection mailed Sep. 8, 2008 for U.S. Appl. No. 11/478,306, filed Jun. 30, 2006, 7 pgs.
Final Rejection mailed Mar. 9, 2009 for U.S. Appl. No. 11/478,306, 8 pgs (incorrectly labeled Non-Final Rejection).
Non-Final Rejection mailed Jul. 17, 2009 for U.S. Appl. No. 11/478,306, 10 pgs.
Final Rejection mailed Dec. 14, 2009 for U.S. Appl. No. 11/478,306, 10 pgs.
Kerssemakers Sander
Kok Martinus Joseph
Plug Reinder Teun
ASML Netherlands B.V.
Sterne Kessler Goldstein & Fox P.L.L.C.
Toatley Jr. Gregory J
Ton Tri T
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