Apparatus for and method of treating substrate

Details Apparatus for and method of treating substrate Apparatus for and method of treating substrate

1996-09-11

1999-05-18

Walton, George L.

Fluid handling

Processes

With control of flow by a condition or characteristic of a...

1341042, 134122R, 134182, 134186, 134902, 137386, 137392, 222 64, F16K21/16;31/02;33/00

Patent

active

059041692

ABSTRACT:
An apparatus for treating a substrate with a predetermined treatment liquid includes: a first storing portion for storing the treatment liquid; a supplying device for supplying the treatment liquid stored by the first storing device to the substrate located at a predetermined position; a receiving portion for receiving the treatment liquid supplied to the substrate after applied to the substrate; a second storing portion for storing the treatment liquid received by the receiving device; an introducing system for introducing the treatment liquid stored by the second storing portion to the first storing portion; and a controlling device for controlling the introducing system so as to prevent bubbles included in the treatment liquid stored by the second storing portion from introduction to the first storing portion.

REFERENCES:
patent: 3425952 (1969-02-01), Gaughan et al.
patent: 3524457 (1970-08-01), Laimbock
patent: 4388276 (1983-06-01), Konstantouros et al.
patent: 5150727 (1992-09-01), D'Amato
patent: 5247953 (1993-09-01), D'Amato

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