Apparatus for and method of thermophoretic protection of an...

Details Apparatus for and method of thermophoretic protection of an... Apparatus for and method of thermophoretic protection of an...

2006-03-09

2010-06-29

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C355S030000, C034S403000

Reexamination Certificate

active

07745079

ABSTRACT:
Embodiments disclosed herein relate to an apparatus for and method of protecting a reticle in a lithography system from particle deposition using thermophoresis, but still allowing a high vacuum area for the photo-optics.

REFERENCES:
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patent: 6253464 (2001-07-01), Klebanoff et al.
patent: 7030959 (2006-04-01), Sogard
patent: 7367138 (2008-05-01), Sogard
Gallis, M. A., et al., “Thermophoresis in Rarefied Gas Flows,”Aerosol Science and Technology, 36: 1099-1117, 2002.
Dedrick, Daniel E., et al., “Verification studies of thermophoretic protection for extreme ultraviolet masks,”J. Vac. Sci. Technol., B 23(1): 307-317, Jan./Feb. 2005.

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