Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium
Reexamination Certificate
2005-10-06
2009-10-06
Mathews, Alan A (Department: 2851)
Photography
Fluid-treating apparatus
Fluid application to one side only of photographic medium
C396S627000, C430S325000
Reexamination Certificate
active
07597491
ABSTRACT:
A puddle of developer supplied from a developer discharge nozzle is placed on a substrate held stationary. Next, the substrate is held stationary for a predetermined length of time, with the puddle of developer allowed to remain on the substrate. This causes a development reaction to proceed. Subsequently, deionized water is supplied from a deionized water discharge nozzle to the substrate to stop the development reaction, and the substrate is rotated while part of the puddle of developer is allowed to remain on the surface of the substrate. This makes a dissolution product easy to diffuse in the developer remaining on the surface of the substrate to promote the dissolution of the resist. A rinsing process and a drying process are performed to complete the development process.
REFERENCES:
patent: 2001/0009452 (2001-07-01), Matsuyama et al.
patent: 2001/0014224 (2001-08-01), Hasebe et al.
patent: 2002/0121341 (2002-09-01), Tanaka et al.
patent: 2004/0096760 (2004-05-01), Tateyama et al.
patent: 2001-274082 (2001-10-01), None
patent: 2002-075821 (2002-03-01), None
patent: 2003-332228 (2003-11-01), None
English translation of JP 10-20508 (dated Jan. 23, 1998).
English translation of JP 2003-100601 (dated Apr. 4, 2003).
Office Action issued by Japanese Patent Office on May 13, 2009 in connection with corresponding Japanese Patent Application No. 2004-311966.
English translation of Japanese Office Action issued May 13, 2009 submitted as a statement of relevancy of the prior art against instant application.
Harumoto Masahiko
Sanada Masakazu
Dainippon Screen Mfg. Co,. Ltd.
Mathews Alan A
Ostrolenk Faber LLP
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