Apparatus for and method of processing substrate

Coating apparatus – Control means responsive to a randomly occurring sensed... – Temperature responsive

Reexamination Certificate

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C118S429000

Reexamination Certificate

active

07341634

ABSTRACT:
A workpiece is processed uniformly, e.g., a uniform plated film is formed on a workpiece, by a processing liquid, e.g., a plating solution, which is maintained in an optimum state while minimizing the amount of the processing liquid to be used. An apparatus for processing the workpiece has a plurality of solution supply tanks50a, 50bfor individually holding a plurality of solutions, respectively, to be mixed into a processing liquid54while managing the temperatures of the solutions, a plurality of mixing tanks52a, 52bfor mixing the solutions individually supplied from the solution supply tanks50a, 50binto the processing liquid54while managing the temperatures of the solutions, and a processing bath56for introducing the processing liquid54therein and processing the workpiece, e.g., a substrate W, by bringing the workpiece into contact with the processing liquid54while managing the temperature of the processing liquid54.

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