Apparatus for and method of processing substrate

Details Apparatus for and method of processing substrate Apparatus for and method of processing substrate

1996-02-02

1999-07-06

Bell, Janyce

Coating processes

With post-treatment of coating or coating material

Cooling

118500, 118503, 134 90, 134105, 1344682, 134902, 427240, 427299, 427314, 427553, 4273722, B05D 300, B05C 1300, B08B 300

Patent

active

059195290

ABSTRACT:
A plurality of transporter robots are provided on respective rails. Each semiconductor substrate is transported by a first robot from an indexer to processing units and then to a cooling plate. The second robot comes to the cooling plate and transports the substrate to other processing units. The cooling plate is used as an interface for the exchange of the substrate between the robots. No liquids nor gasses are applied to the substrate in the cooling plate and the substrate is passed to the next robot without contamination. No dedicated buffers are required, and thereby the size of the apparatus is reduced.

REFERENCES:
patent: 4849253 (1989-07-01), Maricle
patent: 4871579 (1989-10-01), Bravet et al.
patent: 4985722 (1991-01-01), Ushijima et al.
patent: 5069155 (1991-12-01), Kunze-Concewitz
patent: 5252364 (1993-10-01), Inoue et al.
patent: 5569439 (1996-10-01), Cardini et al.
patent: 5578127 (1996-11-01), Kimura

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