Apparatus for and method of polishing and planarizing polycrysta

Abrading – Abrading process – Glass or stone abrading

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451289, 451 7, B24B 100, B24B 719, B24B 730

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057254133

ABSTRACT:
Disclosed are polished and planarized diamond films and a method and apparatus for polishing and planarizing diamond films. The method generally includes mechanical polishing of the diamond film against a ceramic surface in the presence of a treating agent of potassium nitrate and a polishing agent of potassium hydroxide. The produced films have an average surface roughness on the order of 0.05 microns, a planarization uniformity within eight percent, and are relatively free of process-induced contaminants.

REFERENCES:
patent: 1933373 (1933-10-01), Fraser
patent: 3421956 (1969-01-01), Ebert et al.
patent: 3720689 (1973-03-01), Pohl et al.
patent: 4519168 (1985-05-01), Cesna
patent: 4601755 (1986-07-01), Melard et al.
patent: 4662348 (1987-05-01), Hall et al.
patent: 4925701 (1990-05-01), Jansen et al.
patent: 5006203 (1991-04-01), Purdes
patent: 5017403 (1991-05-01), Pang et al.
patent: 5104828 (1992-04-01), Morimoto et al.
patent: 5133792 (1992-07-01), Purohit et al.
patent: 5225275 (1993-07-01), Aida
patent: 5244712 (1993-09-01), Eden
patent: 5246884 (1993-09-01), Jaso et al.
patent: 5248079 (1993-09-01), Li
patent: 5297365 (1994-03-01), Nishioka et al.
patent: 5300188 (1994-04-01), Tessmer et al.
patent: 5392982 (1995-02-01), Li
patent: 5472370 (1995-12-01), Malshe et al.
"Searching for perfect planarity", Semiconductor International, Mar. 1992.
"Chemical vapor deposition of diamond for electric packaging applications", David J. Pickrell and David S. Hoover, Inside ISHM Jul. Aug. 1991, at 11-15.
"Diffusion-controlled subcritical crack growth in the presence of a dilute gas environment", B. R. Lawn, Materials Science and Engineering, 13 (1974) 277-283.
"Tewksbury Lecture: control and application of environment-sensitive fracture processes", A.R.C. Westwood, Journal of Materials Science 9 (1974) 1871-1895.
"The polishing of diamonds in the presence of oxidising agents", A.G. Thornton and J. Wilks, Diamond Research 1974, Supplement to Industrial Review, pp. 39-42 (1974).
"Micro-deformation of crystals subjected to point loading", C.A. Brookes et al, Diamond Research, 1974 Supplement to Industrial Diamond Review, pp. 11-15.
Chemical Abstracts, Jun. 3, 1991, vol. 114, No. 22, 114:215800q "Mechanism of the catalytic activiy of potassium hydroxide for oxidation of diamond and graphite by molecular oxygen".
"Diamond Thin Film: Applications in Electronics Packaging", David S. Hoover et al, Feb. 1991, Solid State Technology at 89-92.
"Will diamond shine for ICs?", Semiconductor International Dec. 1993 at 48-52.
"Planarizing Interlevel Dielectrics by Chemical-Mechanical Polishing", Srinivasan Siraram et al., Solid State Technology, May 1992, at 87-91.
"Diamond Depositions -- science & technology" Superconductivity Publications, Inc. 1992, vol. 3, No. 1, at 1, 5 and 6.
"Tribological properties of polished diamond films", Bharat Bhushan et al, J. Appl. Phys. 74(6), 15 Sep. 1993 at 4174-4180.
"Friction and Wear Properties of Chemomechanically Polished Diamond Films", B.K. Gupta, The American Society of Mechanical Engineers STLE/ASME Tribology Conference, New Orleans, La, Oct. 24-27, 1993, 3-Trib-20.
"Smoothing of chemically vapour deposited diamonds films by ion beam irradiation", Atsushi Hirata et al., Thin Solid Films, 212 (1929) 43-48.
"Thermal conductivity in molten-metal-etched diamond films", S. Jin et al., Appl. Phys. Lett. 63 (5), 2 Aug. 1993, at 622-624.
"Growth, polishing, and optical scatter of diamond thin films", T. P. Thorp et al, SPIE vol. 1325 Diamond Optics III (1990) at 230-237.
Gemstones For Everyman, B.W. Anderson, 8th revised edition, 1971 at 62 and FIGS. 6a and 6b.
"Etching of HFCVD Diamond Films in Air, Nitrous Oxide and Argon", K Tankala et al., New Diamond Science and Technology, 1991, at 827-831.
"Thermogravimetric analysis of the oxidation of CVD diamond films", Curtis E. Johnson et al., m J. Mater. Res., vol. 5, No. 11, Nov. 1990, at 2320-2325.
"Smoothening of diamond films with an ArF Laser" Bogli et al., Diamond and Related Materials, 1 (1992) 782-788.
"Laser Polishing of Diamond", Ravi et al., Proceedings fo the Third International Symposium on Diamond Materials.
"Planarizing technique for ion-beam polishing of diamond films", Grogen et al., Applied Optics, vol. 31, No. 10, Apr. 1, 1992, at 1483-1487.
"Development and Performance of a Diamond Film Polishing Apparatus with Hot Metals", Masanori Yoshikawa, SPIE vol. 1325 Diamond Optics III (1990).
Aug. 1995 PCT International Search Report.

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