Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
Patent
1998-04-30
2000-03-07
Meeks, Timothy
Coating processes
Coating by vapor, gas, or smoke
Mixture of vapors or gases utilized
42725532, 42725536, 2041922, 20419222, C23C 1640, C23C 1408
Patent
active
06033732&
ABSTRACT:
A method of depositing a thin film on a substrate by chemical vapor deposition (CVD) including feeding a liquid CVD source material, including a solution in which at least one organometallic complex is dissolved in a solvent, at a constant flow rate to a vaporizer while keeping the CVD source material in a liquid state; vaporizing the liquid CVD source material by heating to form a CVD source material gas; and forming a thin film of a metal oxide on a substrate using the CVD material source gas in a reaction chamber, the thin film including at least titanium, including using TTIP and TiO(Dpm).sub.2 together as the organometallic complex.
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Kawahara et al., Mat. Res. Soc. Symp. Proc., vol. 361, pp. 361-366 (no month), 1995.
Kawahara et al., Jpn. j. Appl. Phys., vol. 33, No. 9B, Part 1, pp. 5129-5134, Sep. 1994.
Kawahara Takaaki
Makita Tetsuro
Okudaira Tomonori
Ono Koichi
Yamamuka Mikio
Meeks Timothy
Mitsushita Denki Kabushiki Kaisha
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