Apparatus for and method of conditioning chemical mechanical pol

Details Apparatus for and method of conditioning chemical mechanical pol Apparatus for and method of conditioning chemical mechanical pol

1998-07-31

2000-01-11

Scherbel, David A.

Abrading

Abrading process

Utilizing fluent abradant

451 40, 451 56, 451 72, 451444, B24B 5300

Patent

active

060129689

ABSTRACT:
A method and apparatus for conditioning a polishing pad. In this method and apparatus a glazed polishing pad is conditioned by being contacted with a stream of cryogenic pellets.

REFERENCES:
patent: 5036630 (1991-08-01), Kaanta et al.
patent: 5341608 (1994-08-01), Mains, Jr.
patent: 5547417 (1996-08-01), Breivogel et al.
patent: 5664987 (1997-09-01), Rentein
patent: 5716264 (1998-02-01), Kimura et al.
patent: 5725417 (1998-03-01), Robinson
patent: 5782675 (1998-07-01), Southwick

Affiliated with

Also associated with

Rating

Apparatus for and method of conditioning chemical mechanical pol does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for and method of conditioning chemical mechanical pol, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for and method of conditioning chemical mechanical pol will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1458065