Apparatus for and method of cleaning substrate

Details Apparatus for and method of cleaning substrate Apparatus for and method of cleaning substrate

1996-12-17

1999-11-02

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

134153, 134181, 134198, 134902, 134184, B08B 302

Patent

active

059750987

ABSTRACT:
A substrate rinsing apparatus of a non-contact type having a high rinsing ability. An ultrasonic rinsing nozzle and a high-pressure rinsing nozzle are both disposed within the same rinsing apparatus. The ultrasonic rinsing nozzle ejects ultrasonic rinsing liquid as a curtain through a slit, while the high-pressure rinsing nozzle ejects a high-pressure rinsing jet toward the ultrasonic rinsing liquid which is ejected toward a substrate. Not only is foreign matter removed by ultrasonic rinsing, but foregoing matter is removed by the high-pressure rinsing jet and is carried away by a flow of the ultrasonic rinsing liquid and washed off the substrate toward a downstream side of rotation of the substrate.

REFERENCES:
patent: 4064885 (1977-12-01), Dussault et al.
patent: 4326553 (1982-04-01), Hall
patent: 5100476 (1992-03-01), Mase et al.
patent: 5186389 (1993-02-01), Shibano
patent: 5368054 (1994-11-01), Koretsky et al.
patent: 5512335 (1996-04-01), Miller et al.
patent: 5601655 (1997-02-01), Bok et al.

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