Apparatus for and method of cleaning and removing static charges

Details Apparatus for and method of cleaning and removing static charges Apparatus for and method of cleaning and removing static charges

1977-10-13

1979-01-02

Caroff, Marc L.

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 18, 134 21, 134 25A, 134 30, 134 33, 134 37, 134102, 134153, 134200, B08B 302, B08B 310, B08B 500, B08B 600

Patent

active

041325672

ABSTRACT:
Wafers are cleaned in the manufacture of integrated circuits by revolving the wafers successively through a spray of deionized water and drying nitrogen gas in a closed chamber, and introducing ionized nitrogen gas into the closed chamber to eliminate static electric charge on the wafers. The ionized nitrogen gas is generated by passing nitrogen gas through nozzles having electrodes therein maintained at a high ionizing voltage.

REFERENCES:
patent: 3071497 (1963-01-01), Hinson
patent: 3668008 (1972-06-01), Severynse
patent: 3868271 (1975-02-01), Poley et al.
patent: 3990462 (1976-11-01), Elftmann et al.
patent: 3991479 (1976-11-01), Dionne
patent: 4027686 (1977-06-01), Shortes et al.

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