Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1985-07-03
1987-03-24
Demers, Arthur P.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
250398, 20419211, 20419231, 20419232, G23C 1400
Patent
active
046523570
ABSTRACT:
Apparatus for and a method of modifying the properties of a material.
A single ion beam from a source in a vacuum chamber is deflected by an electrostatic deflection system between a target and a substrate. When on the target, the beam sputters material therefrom on to the substrate. When on the substrate the beam bombards material previously deposited on it from the target which mixes it with the material of the substrate. A modified surface layer may therefore be achieved. The target and substrate may be moved relative to the beam if desired and the process may be monitored and controlled using appropriate sensors and controls.
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Weissmantel et al., Proc. 6th Intern. Vaccum Cong., 1974, J. App. Phys. Suppl. 2, OtI, 1974, pp. 509-512.
Schiller et al., J. Vac. Sci-Tech. 12(1975), pp. 858-864.
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Siohansi, Thin Solid Films 118(1984), pp. 61-71.
Colligon John S.
Hill Arthur E.
Kheyrandish Hamid
Demers Arthur P.
University of Salford
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