Coating apparatus – Gas or vapor deposition – With treating means
Patent
1986-02-28
1990-12-04
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
C23C 1650
Patent
active
049745433
ABSTRACT:
An apparatus for preparing plasma deposited films comprised of a first electrode means; a second counterelectrode means; a receptable means for the first electrode means, and the second counterelectrode means; a substrate means to be coated contained on the first electrode means, which electrode means has contained therein permanent magnets; a gas inlet means; and a gas exhaust means, wherein a silane gas is introduced into the receptacle in a crossflow direction perpendicular to the axis of the cylindrical member.
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Bueker Richard
Byorick Judith L.
Palazzo Eugene O.
Xerox Corporation
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