Apparatus for advance edge detection and sewing

Sewing – Elements – Frames

Patent

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11212112, D05B 2100

Patent

active

052052320

ABSTRACT:
Method and apparatus for edge location analysis preliminary to sewing on a separate computerized sewing apparatus including scanning an object to be sewn by moving it under a scanning assembly in accordance with a predetermined sewing path to provide true edge location data, comparing the true edge location data with the expected edge locations to determine any deviations, and sewing the object using the predetermined sewing path as modified by the true edge locations data.

REFERENCES:
patent: 4526116 (1985-07-01), Mannel
patent: 4834008 (1989-05-01), Sadeh et al.
patent: 4932343 (1990-06-01), Mardix et al.
patent: 4991524 (1991-02-01), Ozaki
patent: 5021965 (1991-06-01), Olbrich
"Industrial Electronics", IEEE Spectrum, Jan. 1985, pp. 68-71.

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